Technological Innovation I Dedicated Application I Superior Quality I Attentive Service I IAS-HF900I HF Chemical I concentration monitor The IAS-HF900 series HF concentration analyzer is an advanced instrument designed by our company for critical cleaning and etching processes. With the development of 65nm and 45nm devices, chemical solutions traditionally used in RCA cleaning require increasingly precise low-concentration control. The HF900 employs sensors to achieve high-precision, high-speed measurement of low-concentration hydrofluoric acid, making it ideal for single-tank and wafer cleaning applications. Product Features Precise measurement of low-concentration HF High-precision measurement capability with repeatability accuracy up to ±0.5% of full scale, meeting the control demands of increasingly precise semiconductor etching processes. Multiple measurement modes with integrated temperature compensation algorithms Temperature-compensated HF concentration measurement based on the temperature characteristics of substances. Additionally, the equipment can function as a conductivity meter, supporting low-concentration dilution control for other chemical solutions. Multi-interface compatibility design Integrated RS-485 communication interface alongside analog interfaces, enabling real-time viewing of measurement data, querying, and modification of equipment parameters via remote communication.

Measurement Method Electrode Coefficient Temperature Sensor Specifications Measurement Range Conductivity/Concentration Conversion Method Approximately 4.99 Platinum resistance 10000 /0°C Temperature coefficient 3750ppm /°C standard Accuracy Signal Output Relay Output Communication Output Calibration Function Transmission Hold Self-Diagnostic Function Temperature Compensation Temperature Compensation Range Environmental Conditions Power Supply Protection Structure Weight Compliance Standards Compatible Sensor HF Repeatability Range: Within ±0.5% of full scale 0 to 5,000 ppm: ±25 ppm 0 to 10,000...